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List of scientific papers.
2008:
Textured Silicon Surface passivation by High rate Expanding Thermal Plasma Deposited SiN and Thermal SiO2/SiN Stacks for Crystalline Silicon Solar Cells. A.J.M. van Erven, R.C.M. Bosch and M.D.Bijker. Progress in Photovoltaics: Research and Applications. Volume 16. pp. 615 - 627.
2007:
R. C. M. Bosch, C. H. Kant, A. J. M. van Erven, W. T. M. Stals, and M. D. Bijker, Radiative wafer heating during plasma deposition process , Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 25, Issue 3, 2007, pp. 508-513. Download
A.J.M. van Erven, R.C.M. Bosch and M.D. Bijker, Textured silicon surface passivation by ETP deposited SiN and thermal SiO2/SiN stacks for crystalline silicon solar cells, submitted for publication in Progress in Photopholtaics Download
R.C.M. Bosch, A.J.M. van Erven, E. Wielders, W.T.M. Stals, E. Dullemeier and M.D. Bijker, New compact silicon nitride deposition system for 1500 solar cells per hour, Proceedings 22nd European Photovoltaic Solar Energy Conference, Milaan, 2CV.5.35, 2007, p. 1565 - 1568. Download
2006:
B. Hoex, F.J.J. Peeters, A. J. M. van Erven, M.D. Bijker, W.M.M. Kessels and M.C.M. van de Sanden, High-rate deposition of silicon nitride and silicon oxide films for surface passivation and (anti)reflection coating applications, IEEE 4th World Conference on Photovoltaic Energy conversion, Waikoloka, Hawaii, 2006. Download
C.H. Kant, A. J. M. van Erven, R. C. M. Bosch, W. T. M. Stals, M.D. Bijker, Infrared hetaing with Opaque quartz reflector technology, IEEE 4th World Conference on Photovoltaic Energy conversion, Waikoloka, Hawaii, 2006. Download
B. Hoex, F.J.J. Peeters, A. J. M. van Erven, M.D. Bijker, W.M.M. Kessels and M.C.M. van de Sanden, High-rate deposition of silicon nitride and silicon oxide films for surface passivation and (anti)reflection coating applications, IEEE 4th World Conference on Photovoltaic Energy conversion, Waikoloka, Hawaii, 2006. Download
A.J.M. van Erven, R.C.M. Bosch, W.T.M. Stals, C.H. Kant, R. Backer and M.D. Bijker Characterization of stress in high-rate ETP deposited silicon nitride before and after annealing, Proceedings 21st European Photovoltaic Solar Energy Conference, Dresden, 2DV.2.18, 2006, pp. 1371 - 1374. Download
2005:
B. Hoex, A.J.M van Erven, R.C.M. Bosch, W.T.M. Stals, M.D. Bijker, P.J. van den Oever, W.M.M. Kessels, M.C.M van de Sanden, “Industrial High rate (~ 5 nm/s) Deposited Silicon Nitride Yielding High Quality Bulk And Surface Passivation Under Optimum Anti relfection Coating Conditions”, Progress in Photopholtaics, Vol 13, 2005, pp 705. Download
A.J.M. van Erven, R.C.M. Bosch, R. Toelle, O. Voigt, S. Petri and M.D. Bijker, Ultra high-rate ETP deposited silicon nitride for >15% in-line processed multicrystalline silicon solar cells, Proceedings of the 31st IEEE Photovoltaic Specialists Conference and Exhibition, Lake Buena Vista, 2005, pp. 947 - 950. Download
W.M.M. Kessels, P.J. van den Oever, B. Hoex, R.C.M. Bosch, A.J.M. van Erven, M.D. Bijker, and M.C.M. van de Sanden, Controlling the silicon nitride film density for ultrahigh rate deposition of top quality anti reflection coatings, Proceedings of the 31st IEEE Photovoltaic Specialists Conference and Exhibition, Lake Buena Vista, 2005, pp. 1253 - 1256. Download
P.J. van den Oever, W.M.M. Kessels, B. Hoex, R.C.M. Bosch, A.J.M. van Erven, R.L.J.R. Pennings, W.T.M. Stals, M.D. Bijker, and M.C.M. van de Sanden, Plasma Properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells, Proceedings of the 31st IEEE Photovoltaic Specialists Conference and Exhibition, Lake Buena Vista, 2005, pp 1320 - 1322. Download
A.J.M. van Erven, R.C.M. Bosch, B. Hoex, M Bennett, B. Kumar, S. Narayanan, T. Koval and M.D. Bijker, Application of ultra high-rate ETP deposited silicon nitride for screen printed crystalline silicon solar cells, Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, 2DV.2.45, 2005, p. 1450 - 1453. Download
B. Hoex, A.J.M. van Erven, R.C.M. Bosch, M.D. Bijker, P.J. vanden Oever, W.M.M. Kessels and M.C.M. van de Sanden, Industrial High rate (3 4nm/s) deposited silicon nitride with low surface recombination velocities under optimum antireflection coating conditions, Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, 2DV.2.29, 2005, p. 1385 - 1390. Download
P.J. van den Oever, W.M.M. Kessels, B. Hoex, R.C.M. Bosch, A.J.M. van Erven, M.D. Bijker, and M.C.M. van de Sanden, A novel commercial plasma source for ultrahigh rate deposition of silicon nitride for c-Si solar cells, Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, 2DV.2.31, 2005, p. 1395 - 1398. Download

2004:
R.C.M. Bosch, W.T.M. Stals, A.J.M. van Erven, R.L.J.R. Pennings, M.D. Bijker, “High-throughput PECVD production machine for in-line SiN deposition on silicon solar cells”, Proceedings 19th European Photovoltaic Solar Energy Conference, Paris, 2CV.2.69, 2004, pp. 1098 - 1102. Download
A.J.M. van Erven, A. W. Weeber, R. C. M. Bosch, and M.D. Bijker, “Effects of different firing profiles on layer characteristics and passivation properties of industrial ETP deposited silicon nitride films”, Proceedings 19th European Photovoltaic Solar Energy Conference, Paris, 2CV.2.20, 2004, pp. 927 - 930. Download

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